| Literature DB >> 25367702 |
Haolin Wang1, Xingwang Zhang, Junhua Meng, Zhigang Yin, Xin Liu, Yajuan Zhao, Liuqi Zhang.
Abstract
Ion beam sputtering deposition (IBSD) is used to synthesize high quality few-layer hexagonal boron nitride (h-BN) on copper foils. Compared to the conventional chemical vapor deposition, the IBSD technique avoids the use of unconventional precursors and is much easier to control, which should be very useful for the large-scale production of h-BN in the future.Entities:
Keywords: hexagonal boron nitrides; hydrogen; ion beam sputtering deposition
Year: 2014 PMID: 25367702 DOI: 10.1002/smll.201402468
Source DB: PubMed Journal: Small ISSN: 1613-6810 Impact factor: 13.281