Literature DB >> 25352030

Tailoring of the carbon nanowall microstructure by sharp variation of plasma radical composition.

Kirill V Mironovich1, Daniil M Itkis, Dmitry A Semenenko, Sarkis A Dagesian, Lada V Yashina, Elmar Yu Kataev, Yuri A Mankelevich, Nikolay V Suetin, Victor A Krivchenko.   

Abstract

In this paper we propose a new and simple method to tune the carbon nanowall microstructure by sharp variation of CH4/H2 plasma conditions. Using theoretical calculations we demonstrated that the sharp variation of gas pressure and discharge current leads to significant variation of plasma radical composition. In some cases such perturbation creates the necessary conditions for the nucleation of smaller secondary nanowalls on the surface of primary ones.

Entities:  

Year:  2014        PMID: 25352030     DOI: 10.1039/c4cp03956d

Source DB:  PubMed          Journal:  Phys Chem Chem Phys        ISSN: 1463-9076            Impact factor:   3.676


  1 in total

1.  Process-specific mechanisms of vertically oriented graphene growth in plasmas.

Authors:  Subrata Ghosh; Shyamal R Polaki; Niranjan Kumar; Sankarakumar Amirthapandian; Mohamed Kamruddin; Kostya Ken Ostrikov
Journal:  Beilstein J Nanotechnol       Date:  2017-08-10       Impact factor: 3.649

  1 in total

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