Literature DB >> 25311105

Bottom-up nanostructured bulk silicon: a practical high-efficiency thermoelectric material.

Aikebaier Yusufu1, Ken Kurosaki, Yoshinobu Miyazaki, Manabu Ishimaru, Atsuko Kosuga, Yuji Ohishi, Hiroaki Muta, Shinsuke Yamanaka.   

Abstract

The effectiveness of thermoelectric (TE) materials is quantified by the dimensionless figure of merit (zT). An ideal way to enhance zT is by scattering phonons without scattering electrons. Here we show that, using a simple bottom-up method, we can prepare bulk nanostructured Si that exhibits an exceptionally high zT of 0.6 at 1050 K, at least three times higher than that of the optimized bulk Si. The nanoscale precipitates in this material connected coherently or semi-coherently with the Si matrix, effectively scattering heat-carrying phonons without significantly influencing the material's electron transport properties, leading to the high zT.

Entities:  

Year:  2014        PMID: 25311105     DOI: 10.1039/c4nr04470c

Source DB:  PubMed          Journal:  Nanoscale        ISSN: 2040-3364            Impact factor:   7.790


  2 in total

1.  Nanostructured bulk Si for thermoelectrics synthesized by surface diffusion/sintering doping.

Authors:  Sora-At Tanusilp; Naoki Sadayori; Ken Kurosaki
Journal:  RSC Adv       Date:  2019-05-17       Impact factor: 3.361

2.  Independent control of electrical and heat conduction by nanostructure designing for Si-based thermoelectric materials.

Authors:  Shuto Yamasaka; Kentaro Watanabe; Shunya Sakane; Shotaro Takeuchi; Akira Sakai; Kentarou Sawano; Yoshiaki Nakamura
Journal:  Sci Rep       Date:  2016-03-14       Impact factor: 4.379

  2 in total

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