| Literature DB >> 25213887 |
Meredith J Hampton1, Stuart S Williams, Zhilian Zhou, Janine Nunes, Doo-Hyun Ko, Joseph L Templeton, Edward T Samulski, Joseph M DeSimone.
Abstract
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.Entities:
Keywords: embossing; inorganic oxides; patterning; perfluoropolyether elastomers; polymers; soft lithography
Year: 2008 PMID: 25213887 DOI: 10.1002/adma.200702495
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849