| Literature DB >> 25161832 |
Tomi Roinila1, Xiao Yu2, Jarmo Verho1, Tie Li2, Pasi Kallio1, Matti Vilkko1, Anran Gao2, Yuelin Wang2.
Abstract
Silicon nanowire-based field-effect transistors (SiNW FETs) have demonstrated the ability of ultrasensitive detection of a wide range of biological and chemical targets. The detection is based on the variation of the conductance of a nanowire channel, which is caused by the target substance. This is seen in the voltage-current behavior between the drain and source. Some current, known as leakage current, flows between the gate and drain, and affects the current between the drain and source. Studies have shown that leakage current is frequency dependent. Measurements of such frequency characteristics can provide valuable tools in validating the functionality of the used transistor. The measurements can also be an advantage in developing new detection technologies utilizing SiNW FETs. The frequency-domain responses can be measured by using a commercial sine-sweep-based network analyzer. However, because the analyzer takes a long time, it effectively prevents the development of most practical applications. Another problem with the method is that in order to produce sinusoids the signal generator has to cope with a large number of signal levels. This may become challenging in developing low-cost applications. This paper presents fast, cost-effective frequency-domain methods with which to obtain the responses within seconds. The inverse-repeat binary sequence (IRS) is applied and the admittance spectroscopy between the drain and source is computed through Fourier methods. The methods is verified by experimental measurements from an n-type SiNW FET.Entities:
Keywords: admittance spectroscopy; excitation design; frequency characterization; frequency response; silicon nanowire
Year: 2014 PMID: 25161832 PMCID: PMC4142974 DOI: 10.3762/bjnano.5.110
Source DB: PubMed Journal: Beilstein J Nanotechnol ISSN: 2190-4286 Impact factor: 3.649
Figure 1Conceptual diagram of a SiNW FET.
Figure 2Typical measurement system.
Figure 3Shape of the power spectrum of IRS from 5-bit length shift register.
Figure 4Schematic of the applied SiNW FET device.
Figure 5SEM image of the SiNW FET device. The scale bar is 20 µm.
Figure 6Ids–Vds DC measurement results.
Figure 7Ids–Vg DC measurement results.
Figure 8Conceptual diagram of the measurement setup.
Figure 9Simplified schematic of the measurement amplifier.
Parameters used in the experiment.
| parameter | value | unit |
| excitation signal length, | 510 | bits |
| generation frequency, | 100 | kHz |
| number of excitation periods, | 200 | |
| excitation amplitude, | 1 | mV |
| sampling frequency, | 400 | kHz |
Figure 10Generated excitation sequence; a) sample in the time domain, and b) (scaled) energy content.
Figure 11Admittance spectroscopy for gate voltages from 1.0 V to 3.0 V.
Figure 12Admittance spectroscopy for gate voltages of 2.0 V and 2.2 V.