Literature DB >> 25093626

Palladium nanoparticle formation on TiO₂(110) by thermal decomposition of palladium(II) hexafluoroacetylacetonate.

Amir Gharachorlou1, Michael D Detwiler, Anna V Nartova, Yu Lei, Junling Lu, Jeffrey W Elam, W Nicholas Delgass, Fabio H Ribeiro, Dmitry Y Zemlyanov.   

Abstract

Palladium nanoparticles were synthesized by thermal decomposition of palladium(II) hexafluoroacetylacetonate (Pd(hfac)2), an atomic layer deposition (ALD) precursor, on a TiO2(110) surface. According to X-ray photoelectron spectroscopy (XPS), Pd(hfac)2 adsorbs on TiO2(110) dissociatively yielding Pd(hfac)(ads), hfac(ads), and adsorbed fragments of the hfac ligand at 300 K. A (2 × 1) surface overlayer was observed by scanning tunneling microscopy (STM), indicating that hfac adsorbs in a bidentate bridging fashion across two Ti 5-fold atoms and Pd(hfac) adsorbs between two bridging oxygen atoms on the surface. Annealing of the Pd(hfac)(ads) and hfac(ads) species at 525 K decomposed the adsorbed hfac ligands, leaving PdO-like species and/or Pd atoms or clusters. Above 575 K, the XPS Pd 3d peaks shift toward lower binding energies and Pd nanoparticles are observed by STM. These observations point to the sintering of Pd atoms and clusters to Pd nanoparticles. The average height of the Pd nanoparticles was 1.2 ± 0.6 nm at 575 K and increased to 1.7 ± 0.5 nm following annealing at 875 K. The Pd coverage was estimated from XPS and STM data to be 0.05 and 0.03 monolayers (ML), respectively, after the first adsorption/decomposition cycle. The amount of palladium deposited on the TiO2(110) surface increased linearly with the number of adsorption/decomposition cycles with a growth rate of 0.05 ML or 0.6 Å per cycle. We suggest that the removal of the hfac ligand and fragments eliminates the nucleation inhibition of Pd nanoparticles previously observed for the Pd(hfac)2 precursor on TiO2.

Entities:  

Year:  2014        PMID: 25093626     DOI: 10.1021/am504127k

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  6 in total

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Authors:  Amir Gharachorlou; Michael D Detwiler; Xiang-Kui Gu; Lukas Mayr; Bernhard Klötzer; Jeffrey Greeley; Ronald G Reifenberger; W Nicholas Delgass; Fabio H Ribeiro; Dmitry Y Zemlyanov
Journal:  ACS Appl Mater Interfaces       Date:  2015-07-23       Impact factor: 9.229

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6.  Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone.

Authors:  Yiming Zou; Chunyu Cheng; Yuanyuan Guo; Amanda Jiamin Ong; Ronn Goei; Shuzhou Li; Alfred Iing Yoong Tok
Journal:  RSC Adv       Date:  2021-06-28       Impact factor: 4.036

  6 in total

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