Literature DB >> 25056141

Ferroelectric tunnel junctions for information storage and processing.

Vincent Garcia1, Manuel Bibes1.   

Abstract

Computer memory that is non-volatile and therefore able to retain its information even when switched off enables computers that do not need to be booted up. One of the technologies for such applications is ferroelectric random access memories, where information is stored as ferroelectric polarization. To miniaturize such devices to the size of a few nanometres, ferroelectric tunnel junctions have seen considerable interest. There, the electric polarization determines the electrical resistance of these thin films, switching the current on and off. With control over other parameters such as magnetism also being possible, ferroelectric tunnel junctions represent a promising and flexible device design.

Year:  2014        PMID: 25056141     DOI: 10.1038/ncomms5289

Source DB:  PubMed          Journal:  Nat Commun        ISSN: 2041-1723            Impact factor:   14.919


  35 in total

1.  Low-energy Resistive Random Access Memory Devices with No Need for a Compliance Current.

Authors:  Zedong Xu; Lina Yu; Yong Wu; Chang Dong; Ning Deng; Xiaoguang Xu; J Miao; Yong Jiang
Journal:  Sci Rep       Date:  2015-05-18       Impact factor: 4.379

2.  Suppression of creep-regime dynamics in epitaxial ferroelectric BiFeO3 films.

Authors:  Y J Shin; B C Jeon; S M Yang; I Hwang; M R Cho; D Sando; S R Lee; J-G Yoon; T W Noh
Journal:  Sci Rep       Date:  2015-05-27       Impact factor: 4.379

3.  Optically controlled electroresistance and electrically controlled photovoltage in ferroelectric tunnel junctions.

Authors:  Wei Jin Hu; Zhihong Wang; Weili Yu; Tom Wu
Journal:  Nat Commun       Date:  2016-02-29       Impact factor: 14.919

4.  Encoding, training and retrieval in ferroelectric tunnel junctions.

Authors:  Hanni Xu; Yidong Xia; Bo Xu; Jiang Yin; Guoliang Yuan; Zhiguo Liu
Journal:  Sci Rep       Date:  2016-05-31       Impact factor: 4.379

5.  Low-field Switching Four-state Nonvolatile Memory Based on Multiferroic Tunnel Junctions.

Authors:  H M Yau; Z B Yan; N Y Chan; K Au; C M Wong; C W Leung; F Y Zhang; X S Gao; J Y Dai
Journal:  Sci Rep       Date:  2015-08-04       Impact factor: 4.379

6.  Functional ferroelectric tunnel junctions on silicon.

Authors:  Rui Guo; Zhe Wang; Shengwei Zeng; Kun Han; Lisen Huang; Darrell G Schlom; T Venkatesan; Jingsheng Chen
Journal:  Sci Rep       Date:  2015-07-28       Impact factor: 4.379

7.  Unravelling and controlling hidden imprint fields in ferroelectric capacitors.

Authors:  Fanmao Liu; Ignasi Fina; Riccardo Bertacco; Josep Fontcuberta
Journal:  Sci Rep       Date:  2016-04-28       Impact factor: 4.379

8.  Tunnel electroresistance through organic ferroelectrics.

Authors:  B B Tian; J L Wang; S Fusil; Y Liu; X L Zhao; S Sun; H Shen; T Lin; J L Sun; C G Duan; M Bibes; A Barthélémy; B Dkhil; V Garcia; X J Meng; J H Chu
Journal:  Nat Commun       Date:  2016-05-04       Impact factor: 14.919

9.  Optical Imaging of Nonuniform Ferroelectricity and Strain at the Diffraction Limit.

Authors:  Ondrej Vlasin; Blai Casals; Nico Dix; Diego Gutiérrez; Florencio Sánchez; Gervasi Herranz
Journal:  Sci Rep       Date:  2015-11-02       Impact factor: 4.379

10.  Space-charge Effect on Electroresistance in Metal-Ferroelectric-Metal capacitors.

Authors:  Bo Bo Tian; Yang Liu; Liu Fang Chen; Jian Lu Wang; Shuo Sun; Hong Shen; Jing Lan Sun; Guo Liang Yuan; Stéphane Fusil; Vincent Garcia; Brahim Dkhil; Xiang Jian Meng; Jun Hao Chu
Journal:  Sci Rep       Date:  2015-12-16       Impact factor: 4.379

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