Literature DB >> 24921772

Monolithic silicon waveguide photodiode utilizing surface-state absorption and operating at 10 Gb/s.

Jason J Ackert, Abdullah S Karar, John C Cartledge, Paul E Jessop, Andrew P Knights.   

Abstract

We have fabricated a waveguide integrated monolithic silicon infrared detector. The photodiode consists of a p-i-n junction across a silicon-on-insulator (SOI) rib waveguide. Absorption is due to surface-states at the silicon/air interface of the waveguide. A 2 mm long detector shows a response of 0.045 A/W (calculated as a function of coupled light) and is capable of operation at 10 Gb/s at a reverse bias voltage of 2 V.

Entities:  

Year:  2014        PMID: 24921772     DOI: 10.1364/OE.22.010710

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  1 in total

1.  Light-induced metal-like surface of silicon photonic waveguides.

Authors:  Stefano Grillanda; Francesco Morichetti
Journal:  Nat Commun       Date:  2015-09-11       Impact factor: 14.919

  1 in total

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