| Literature DB >> 24847984 |
Daesu Lee1, Byung Chul Jeon, Aram Yoon, Yeong Jae Shin, Myang Hwan Lee, Tae Kwon Song, Sang Don Bu, Miyoung Kim, Jin-Seok Chung, Jong-Gul Yoon, Tae Won Noh.
Abstract
Flexoelectric control of defect formation and associated electronic function is demonstrated in ferroelectric BiFeO3 thin films. An intriguing, so far never demonstrated, effect of internal electric field (Eint ) on defect formation is explored by a means of flexoelectricity. Our study provides novel insight into defect engineering, as well as allows a pathway to design defect configuration and associated electronic function.Entities:
Keywords: defect engineering; epitaxial thin film; ferroelectric; flexoelectric; strain gradient
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Year: 2014 PMID: 24847984 DOI: 10.1002/adma.201400654
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849