| Literature DB >> 24769626 |
L Zhao1, H-Y Chen, S-C Wu, Z Jiang, S Yu, T-H Hou, H-S Philip Wong, Y Nishi.
Abstract
Precise electrical manipulation of nanoscale defects such as vacancy nano-filaments is highly desired for the multi-level control of ReRAM. In this paper we present a systematic investigation on the pulse-train operation scheme for reliable multi-level control of conductive filament evolution. By applying the pulse-train scheme to a 3 bit per cell HfO2 ReRAM, the relative standard deviations of resistance levels are improved up to 80% compared to the single-pulse scheme. The observed exponential relationship between the saturated resistance and the pulse amplitude provides evidence for the gap-formation model of the filament-rupture process.Entities:
Year: 2014 PMID: 24769626 DOI: 10.1039/c4nr00500g
Source DB: PubMed Journal: Nanoscale ISSN: 2040-3364 Impact factor: 7.790