Literature DB >> 24737180

Purely electronic switching with high uniformity, resistance tunability, and good retention in Pt-dispersed SiO2 thin films for ReRAM.

Byung Joon Choi1, Albert B K Chen, Xiang Yang, I-Wei Chen.   

Abstract

Resistance switching memory operating by a purely electronic switching mechanism, which was first realized in Pt-dispersed SiO2 thin films, satisfies criteria including high uniformity, fast switching speed, and long retention for non-volatile memory application. This resistive element obeys Ohm's law for the area dependence, but its resistance exponentially increases with the film thickness, which provides new freedom to tailor the device characteristics.
Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  charge transport; data storage; electronic processes; electronic structures; hybrid materials; thin films

Year:  2011        PMID: 24737180     DOI: 10.1002/adma.201102132

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  7 in total

1.  Robust resistive memory devices using solution-processable metal-coordinated azo aromatics.

Authors:  Sreetosh Goswami; Adam J Matula; Santi P Rath; Svante Hedström; Surajit Saha; Meenakshi Annamalai; Debabrata Sengupta; Abhijeet Patra; Siddhartha Ghosh; Hariom Jani; Soumya Sarkar; Mallikarjuna Rao Motapothula; Christian A Nijhuis; Jens Martin; Sreebrata Goswami; Victor S Batista; T Venkatesan
Journal:  Nat Mater       Date:  2017-10-23       Impact factor: 43.841

2.  Filament Geometry Induced Bipolar, Complementary, and Unipolar Resistive Switching under the Same Set Current Compliance in Pt/SiOx/TiN.

Authors:  Dong-Hyeok Lim; Ga-Yeon Kim; Jin-Ho Song; Kwang-Sik Jeong; Dae-Hong Ko; Mann-Ho Cho
Journal:  Sci Rep       Date:  2015-10-22       Impact factor: 4.379

3.  Bias-polarity-dependent resistance switching in W/SiO2/Pt and W/SiO2/Si/Pt structures.

Authors:  Hao Jiang; Xiang Yuan Li; Ran Chen; Xing Long Shao; Jung Ho Yoon; Xiwen Hu; Cheol Seong Hwang; Jinshi Zhao
Journal:  Sci Rep       Date:  2016-02-26       Impact factor: 4.379

4.  Impact of Line Edge Roughness on ReRAM Uniformity and Scaling.

Authors:  Vassilios Constantoudis; George Papavieros; Panagiotis Karakolis; Ali Khiat; Themistoklis Prodromakis; Panagiotis Dimitrakis
Journal:  Materials (Basel)       Date:  2019-11-30       Impact factor: 3.623

5.  Embedded metallic nanoparticles facilitate metastability of switchable metallic domains in Mott threshold switches.

Authors:  Minguk Jo; Ye-Won Seo; Hyojin Yoon; Yeon-Seo Nam; Si-Young Choi; Byung Joon Choi; Junwoo Son
Journal:  Nat Commun       Date:  2022-08-10       Impact factor: 17.694

6.  Dynamic-load-enabled ultra-low power multiple-state RRAM devices.

Authors:  Xiang Yang; I-Wei Chen
Journal:  Sci Rep       Date:  2012-10-17       Impact factor: 4.379

7.  Resistive Switching Characteristic Improvement in a Single-Walled Carbon Nanotube Random Network Embedded Hydrogen Silsesquioxane Thin Films for Flexible Memristors.

Authors:  Shin-Yi Min; Won-Ju Cho
Journal:  Int J Mol Sci       Date:  2021-03-25       Impact factor: 5.923

  7 in total

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