Literature DB >> 24686695

High-efficiency B₄C/Mo₂C alternate multilayer grating for monochromators in the photon energy range from 0.7 to 3.4 keV.

Fadi Choueikani, Bruno Lagarde, Franck Delmotte, Michael Krumrey, Françoise Bridou, Muriel Thomasset, Evgueni Meltchakov, François Polack.   

Abstract

An alternate multilayer (AML) grating has been prepared by coating an ion etched lamellar grating with a B4C/Mo2C multilayer (ML) having a layer thickness close to the groove depth. Such a structure behaves as a 2D synthetic crystal and can reach very high efficiencies when the Bragg condition is satisfied. This AML coated grating has been characterized at the SOLEIL Metrology and Tests Beamline between 0.7 and 1.7 keV and at the four-crystal monochromator beamline of Physikalisch-Technische Bundesanstalt (PTB) at BESSY II between 1.75 and 3.4 keV. A peak diffraction efficiency of nearly 27% was measured at 2.2 keV. The measured efficiencies are well reproduced by numerical simulations made with the electromagnetic propagation code CARPEM. Such AML gratings, paired with a matched ML mirror, constitute efficient monochromators for intermediate energy photons. They will extend the accessible energy for many applications as x-ray absorption spectroscopy or x-ray magnetic circular dichroism experiments.

Entities:  

Year:  2014        PMID: 24686695     DOI: 10.1364/OL.39.002141

Source DB:  PubMed          Journal:  Opt Lett        ISSN: 0146-9592            Impact factor:   3.776


  3 in total

1.  The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II.

Authors:  F Schäfers; P Bischoff; F Eggenstein; A Erko; A Gaupp; S Künstner; M Mast; J-S Schmidt; F Senf; F Siewert; A Sokolov; Th Zeschke
Journal:  J Synchrotron Radiat       Date:  2016-01-01       Impact factor: 2.616

2.  Design of a multilayer-based collimated plane-grating monochromator for tender X-ray range.

Authors:  Xiaowei Yang; Hongchang Wang; Matthew Hand; Kawal Sawhney; Burkhard Kaulich; Igor V Kozhevnikov; Qiushi Huang; Zhanshan Wang
Journal:  J Synchrotron Radiat       Date:  2017-01-01       Impact factor: 2.616

3.  Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase mask.

Authors:  Dakui Lin; Zhengkun Liu; Kay Dietrich; Andréy Sokolov; Mewael Giday Sertsu; Hongjun Zhou; Tonglin Huo; Stefanie Kroker; Huoyao Chen; Keqiang Qiu; Xiangdong Xu; Franz Schäfers; Ying Liu; Ernst Bernhard Kley; Yilin Hong
Journal:  J Synchrotron Radiat       Date:  2019-08-16       Impact factor: 2.616

  3 in total

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