The origin of interferometric effect involving surface plasmon polariton in scattering near-field scanning optical microscopy.

Scattering near-field scanning optical microscopy (s-NSOM) has been developed to characterize optical near field with spatial resolution on the order of 10 nm. In this work we report investigation of the interferometric patterns commonly occurred in s-NSOM measurements. To reveal the origin of such interference patterns, a simple nanoslit is used. Comparing the measured result with a simplified analytical model as well as full-field numerical simulations, it is shown that the interference pattern is predominantly formed by the in-plane component of incidence light and surface plasmon polariton (SPP) launched by the nanoslit. This result helps to understand the responses of plasmonic nanostructures during s-NSOM measurements.