Mechanisms of silicon sputtering and cluster formation explained by atomic level simulations.

In low-energy secondary ion MS, collision cascades result in rare sputter events or unfavourably low sputter yields. To better identify the origin of emission products generated by low-energy ion impacts, we carried out molecular dynamics simulations of the underlying collision cascades, using a reactive force field that accounts for the dynamic breaking and forming of bonds. A detailed explanation of the cluster formation and ejection processes for atomic oxygen and also atomic silicon bombardment of Si (100) is given for comparison.