Literature DB >> 24573800

Laser desorption time-of-flight mass spectrometry of atomic switch memory Ge2Sb2Te5 bulk materials and its thin films.

Jan Houška1, Eladia Maria Peña-Méndez, Jakub Kolář, Jan Přikryl, Martin Pavlišta, Miloslav Frumar, Tomáš Wágner, Josef Havel.   

Abstract

RATIONALE: Although the structure of atomic switch Ge2Sb2Te5 (GST) thin films is well established, the composition of the clusters formed in the plasma plume during pulsed-laser deposition (PLD) is not known. Laser Desorption Ionization Time-of-Flight Mass Spectrometry (LDI-TOF MS) is an effective method for the generation and study of clusters formed by laser ablation of various solids and thus for determining their structural fragments.
METHODS: LDI of bulk or PLD-deposited GST thin layers and of various precursors (Ge, Sb, Te, and Ge-Te or Sb-Te mixtures) using a nitrogen laser (337 nm) was applied while the mass spectra were recorded in positive and negative ion modes using a TOF mass spectrometer equipped with a reflectron while the stoichiometry of the clusters formed was determined via isotopic envelope analysis.
RESULTS: The singly negatively or positively charged clusters identified from the LDI of GST were Ge, Ge2, GeTe, Ge2Te, Ten (n = 1-3), GeTe2, Ge2Te2, GeTe3, SbTe2, Sb2Te, GeSbTe2, Sb3Te and the low abundance ternary GeSbTe3, while the LDI of germanium telluride yielded Gem Ten (+) clusters (m = 1-3, n = 1-3). Several minor Ge-H clusters were also observed for pure germanium and for germanium telluride. Sbn clusters (n = 1-3) and the formation of binary TeSb, TeSb2 and TeSb3 clusters were detected when Sb2Te3 was examined.
CONCLUSIONS: This is the first report that elucidates the stoichiometry of Gem Sbn Tep clusters formed in plasma when bulk or nano-layers of GST material are ablated. The clusters were found to be fragments of the original structure. The results might facilitate the development of PLD technology for this memory phase-change material.
Copyright © 2014 John Wiley & Sons, Ltd.

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Year:  2014        PMID: 24573800     DOI: 10.1002/rcm.6833

Source DB:  PubMed          Journal:  Rapid Commun Mass Spectrom        ISSN: 0951-4198            Impact factor:   2.419


  1 in total

Review 1.  Phase change thin films for non-volatile memory applications.

Authors:  A Lotnyk; M Behrens; B Rauschenbach
Journal:  Nanoscale Adv       Date:  2019-09-18
  1 in total

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