| Literature DB >> 24515204 |
Shy-hauh Guo, Andrei B Sushkov, Dong Hun Park, H Dennis Drew, Paul W Kolb, Warren N Herman, Raymond J Phaneuf.
Abstract
We report on factors affecting the performance of a broadband, mid-IR absorber based on multiple, alternating dielectric / metal layers. In particular, we investigate the effect of interface roughness. Atomic layer deposition produces both a dramatic suppression of the interface roughness and a significant increase in the optical absorption as compared to devices fabricated using a conventional thermal evaporation source. Absorption characteristics greater than 80% across a 300 K black body spectrum are achieved. We demonstrate a further increase in this absorption via the inclusion of a patterned, porous anti-reflection layer.Entities:
Year: 2014 PMID: 24515204 DOI: 10.1364/OE.22.001952
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894