| Literature DB >> 24512372 |
Wan-Yi Chang1, You Wu, Yi-Chang Chung.
Abstract
We present a facile lithographic nanosphere production process by laminating a nanosphere monolayer with a UV resin and applying various gentle solvent treatments to produce "bottom-up" and "bottom-down" nonclose-packed patterns and investigate their practical applications in nanolenses for optical display and nanosuckers for adhesion. The solvents effect depending on its solubility parameter and solubility tendency toward the interior polystyrene nanospheres was discussed. The polymer-based nanosucker pattern displays shear adhesion force as high as 75.2 N/cm(2).Entities:
Year: 2014 PMID: 24512372 DOI: 10.1021/nl4048042
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189