| Literature DB >> 24423232 |
Qazi Humayun1, Muhammad Kashif, Uda Hashim, Ahsanulhaq Qurashi.
Abstract
Selective area growth of ZnO nanorods is accomplished on microgap electrodes (spacing of 6 μm) by using a facile wet chemical etching process. The growth of ZnO nanorods on a selected area of microgap electrode is carried out by hydrothermal synthesis forming nanorod bridge between two electrodes. This is an attractive, genuine, direct, and highly reproducible technique to grow nanowire/nanorod onto the electrodes on selected area. The ZnO nanorods were grown at 90°C on the pre-patterned electrode system without destroying the electrode surface structure interface and geometry. The ZnO nanorods were tested for their application in ultraviolet (UV) sensors. The photocurrent-to-dark (Iph/Id) ratio was 3.11. At an applied voltage of 5 V, the response and recovery time was 72 and 110 s, respectively, and the response reached 2 A/W. The deposited ZnO nanorods exhibited a UV photoresponse that is promising for future cost-effective and low-power electronic UV-sensing applications.Entities:
Year: 2014 PMID: 24423232 PMCID: PMC3912502 DOI: 10.1186/1556-276X-9-29
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Figure 1The entire experimental process and the butterfly topology zero-gap design. (a) Schematic of the side and top views of the entire experimental process and the (b) butterfly topology zero-gap design printed on the chrome mask.
Figure 2SEM images of area-selective deposited ZnO nanorods on microgap electrodes. The images are at different magnification powers: (a) 50 μm, (b) 10 μm, and (c) 5 μm.
Figure 3XRD spectrum of the ZnO nanorods.
Figure 4- curves of the area-selective deposited ZnO nanorods in dark and UV light environments.
Figure 5Spectral responsivity of area-selective deposited ZnO nanorods between the microgap electrodes.
Figure 6- curve of the area-selective deposited ZnO nanorods in dark and UV light environments.