| Literature DB >> 24274897 |
Zhi Yang, Xingzhong Zhu, Xiaolu Huang, Yingwu Cheng, Yun Liu, Huijuan Geng, Yue Wu, Yanjie Su, Hao Wei1, Yafei Zhang.
Abstract
Highly uniform hole spacing micro brushes were fabricated based on aligned carbon nanotube (CNT) arrays synthesized by chemical vapor deposition method with the assistance of anodic aluminum oxide (AAO) template. Different micro brushes from CNT arrays were constructed on silicon, glass, and polyimide substrates, respectively. The micro brushes had highly uniform hole spacing originating from the regularly periodic pore structure of AAO template. The CNT arrays, serving as bristles, were firmly grafted on the substrates. The brushes can easily clean particles with scale of micrometer on the surface of silicon wafer and from the narrow spaces between the electrodes in a series of cleaning experiments. The results show the potential application of the CNT micro brushes as a cleaning tool in microelectronics manufacture field.Entities:
Year: 2013 PMID: 24274897 PMCID: PMC3879083 DOI: 10.1186/1556-276X-8-501
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Figure 1SEM images of the samples. (a) AAO template and (b) CNT arrays.
Figure 2TEM images of CNT. The inset is the low magnification image.
Figure 3Raman spectra of CNT arrays.
Figure 4SEM images of CNTs. (a) Without and (b) with thermal insulation pretreatment.
Figure 5Photo and SEM images of micro brush. (a) Photo of micro brushes, (b) low magnification SEM image of micro brush, and (c) high-magnification SEM image of micro brush.
Figure 6Schematic diagram of micro brush.
Figure 7The cleaning experiments of micro brush. The surface of (a) silicon wafer, (b) the electrode with gap of 100 μm, and (c) the electrode with gap of 2 μm.