| Literature DB >> 24088373 |
T J B M Janssen1, A Tzalenchuk, S Lara-Avila, S Kubatkin, V I Fal'ko.
Abstract
In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.Entities:
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Year: 2013 PMID: 24088373 DOI: 10.1088/0034-4885/76/10/104501
Source DB: PubMed Journal: Rep Prog Phys ISSN: 0034-4885