Literature DB >> 24007296

Multicomponent nanopatterns by directed block copolymer self-assembly.

Dong Ok Shin1, Jeong Ho Mun, Geon-Tae Hwang, Jong Moon Yoon, Ju Young Kim, Je Moon Yun, Yong-Biao Yang, Youngtak Oh, Jeong Yong Lee, Jonghwa Shin, Keon Jae Lee, Soojin Park, Jaeup U Kim, Sang Ouk Kim.   

Abstract

Complex nanopatterns integrating diverse nanocomponents are crucial requirements for advanced photonics and electronics. Currently, such multicomponent nanopatterns are principally created by colloidal nanoparticle assembly, where large-area processing of highly ordered nanostructures raises significant challenge. We present multicomponent nanopatterns enabled by block copolymer (BCP) self-assembly, which offers device oriented sub-10-nm scale nanopatterns with arbitrary large-area scalability. In this approach, BCP nanopatterns direct the nanoscale lateral ordering of the overlaid second level BCP nanopatterns to create the superimposed multicomponent nanopatterns incorporating nanowires and nanodots. This approach introduces diverse chemical composition of metallic elements including Au, Pt, Fe, Pd, and Co into sub-10-nm scale nanopatterns. As immediate applications of multicomponent nanopatterns, we demonstrate multilevel charge-trap memory device with Pt-Au binary nanodot pattern and synergistic plasmonic properties of Au nanowire-Pt nanodot pattern.

Entities:  

Year:  2013        PMID: 24007296     DOI: 10.1021/nn403379k

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  3 in total

1.  Non-native three-dimensional block copolymer morphologies.

Authors:  Atikur Rahman; Pawel W Majewski; Gregory Doerk; Charles T Black; Kevin G Yager
Journal:  Nat Commun       Date:  2016-12-22       Impact factor: 14.919

2.  CMOS-Compatible Top-Down Fabrication of Periodic SiO2 Nanostructures using a Single Mask.

Authors:  Lingkuan Meng; Jianfeng Gao; Xiaobin He; Junjie Li; Yayi Wei; Jiang Yan
Journal:  Nanoscale Res Lett       Date:  2015-08-26       Impact factor: 4.703

3.  Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography.

Authors:  Cian Cummins; Alan P Bell; Michael A Morris
Journal:  Nanomaterials (Basel)       Date:  2017-09-30       Impact factor: 5.076

  3 in total

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