Literature DB >> 23978221

Local reorganization of diblock copolymer domains in directed self-assembly monitored by in situ high-temperature AFM.

Fabrice Stehlin1, Frederic Diot, Agnieszka Gwiazda, Ali Dirani, Mathieu Salaun, Marc Zelsmann, Olivier Soppera.   

Abstract

In situ high-temperature AFM was used to locally follow dynamic processes, leading to directed self-assembly of copolymers in the context of graphoepitaxy. We focused on the effect of heating for temperatures much higher than the Tg of the used PS-b-PMMA polymer. We showed that such conditions favors the block rearrangement, leading to very regular and perfectly aligned structures in limited times. The use of in situ AFM allowed us to locally investigate the self-organization process at high temperature, thus bringing new insights into self-assembly of block copolymers by graphoepitaxy. In particular, we demonstrate that a slight increase of temperature between 180 and 200 °C allowed overpassing an energy barrier and considerably improves the long distance arrangement, even for relatively short times.

Entities:  

Year:  2013        PMID: 23978221     DOI: 10.1021/la402935v

Source DB:  PubMed          Journal:  Langmuir        ISSN: 0743-7463            Impact factor:   3.882


  1 in total

1.  Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly.

Authors:  Benjamin Leuschel; Agnieszka Gwiazda; Wajdi Heni; Frédéric Diot; Shang-Yu Yu; Clémentine Bidaud; Laurent Vonna; Arnaud Ponche; Hamidou Haidara; Olivier Soppera
Journal:  Sci Rep       Date:  2018-07-11       Impact factor: 4.379

  1 in total

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