| Literature DB >> 23886908 |
Na Lu1, Anran Gao, Pengfei Dai, Tie Li, Yi Wang, Xiuli Gao, Shiping Song, Chunhai Fan, Yuelin Wang.
Abstract
Silicon nanowire field-effect transistors (SiNW-FETs) have recently emerged as a type of powerful nanoelectronic biosensors due to their ultrahigh sensitivity, selectivity, label-free and real-time detection capabilities. Here, we present a protocol as well as guidelines for detecting DNA with complementary metal oxide semiconductor (CMOS) compatible SiNW-FET sensors. SiNWs with high surface-to-volume ratio and controllable sizes were fabricated with an anisotropic self-stop etching technique. Probe DNA molecules specific for the target DNA were covalently modified onto the surface of the SiNWs. The SiNW-FET nanosensors exhibited an ultrahigh sensitivity for detecting the target DNA as low as 1 fM and good selectivity for discrimination from one-base mismatched DNA.Entities:
Keywords: (3-aminopropyl) triethoxysilane; APTES; Biosensor; CMOS; CMOS-compatible; CVD; I(DS); Nucleic acids; PCB; PECVD; SEM; SOI; SiNW-FETs; SiNWs; Silicon nanowire; TMAH; Ultra-sensitive; V(DS); V(GS); chemical vapor deposition; complementary metal oxide semiconductor; gate volotage; plasma enhanced chemical vapor deposition; printed circuit board; scanning electron microscopy; silicon nanowire field-effect transistors; silicon nanowires; silicon-on-insulator; source/drain current; source/drain voltage; tetramethylammonium hydroxide
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Year: 2013 PMID: 23886908 DOI: 10.1016/j.ymeth.2013.07.012
Source DB: PubMed Journal: Methods ISSN: 1046-2023 Impact factor: 3.608