| Literature DB >> 23806223 |
Davide Barreca1, Giorgio Carraro, Alberto Gasparotto, Chiara Maccato, Francesca Rossi, Giancarlo Salviati, Massimo Tallarida, Chittaranjan Das, Fernando Fresno, Dorota Korte, Urška Lavrenčič Stangar, Mladen Franko, Dieter Schmeisser.
Abstract
Nanostructured iron(III) oxide deposits are grown by chemical vapor deposition (CVD) at 400-500 °C on Si(100) substrates from Fe(hfa)2TMEDA (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethylethylenediamine), yielding the selective formation of α-Fe2O3 or the scarcely studied ε-Fe2O3 polymorphs under suitably optimized preparative conditions. By using Ti(OPr(i))4 (OPr(i) = iso-propoxy) and water as atomic layer deposition (ALD) precursors, we subsequently functionalized the obtained materials at moderate temperatures (<300 °C) by an ultrathin titanomagnetite (Fe3-xTixO4) overlayer. An extensive multitechnique characterization, aimed at elucidating the system structure, morphology, composition and optical properties, evidenced that the photoactivated hydrophilic and photocatalytic behavior of the synthesized materials is dependent both on iron oxide phase composition and ALD surface modification. The proposed CVD/ALD hybrid synthetic approach candidates itself as a powerful tool for a variety of applications where semiconductor-based nanoarchitectures can benefit from the coupling with an ad hoc surface layer.Entities:
Year: 2013 PMID: 23806223 DOI: 10.1021/am401475g
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229