| Literature DB >> 23784849 |
Ning Han1, Fengyun Wang, Jared J Hou, Sen Po Yip, Hao Lin, Fei Xiu, Ming Fang, Zaixing Yang, Xiaoling Shi, Guofa Dong, Tak Fu Hung, Johnny C Ho.
Abstract
A metal-cluster-decoration approach is utilized to tailor electronic transport properties (e.g., threshold voltage) of III-V NWFETs through the modulation of free carriers in the NW channel via the deposition of different metal clusters with different work function. The versatility of this technique has been demonstrated through the fabrication of high-mobility enhancement-mode InAs NW parallel FETs as well as the construction of low-power InAs NW inverters.Entities:
Keywords: III-V nanowire field-effect transistors; contact printing; inverters; metal decoration; n-channel metal-oxide-semiconductor (NMOS); threshold voltage modulation
Year: 2013 PMID: 23784849 DOI: 10.1002/adma.201301362
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849