| Literature DB >> 23669970 |
Kiyotaka Sasagawa1, Sanshiro Shishido, Keisuke Ando, Hitoshi Matsuoka, Toshihiko Noda, Takashi Tokuda, Kiyomi Kakiuchi, Jun Ohta.
Abstract
In this study, we demonstrate a polarization sensitive pixel for a complementary metal-oxide-semiconductor (CMOS) image sensor based on 65-nm standard CMOS technology. Using such a deep-submicron CMOS technology, it is possible to design fine metal patterns smaller than the wavelengths of visible light by using a metal wire layer. We designed and fabricated a metal wire grid polarizer on a 20 × 20 μm(2) pixel for image sensor. An extinction ratio of 19.7 dB was observed at a wavelength 750 nm.Entities:
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Year: 2013 PMID: 23669970 DOI: 10.1364/OE.21.011132
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894