| Literature DB >> 23637063 |
Xiaopeng Li1, Yanjun Xiao, Jin Ho Bang, Dominik Lausch, Sylke Meyer, Paul-Tiberiu Miclea, Jin-Young Jung, Stefan L Schweizer, Jung-Ho Lee, Ralf B Wehrspohn.
Abstract
Through metal-assisted chemical etching (MaCE), superior purification of dirty Si is observed, from 99.74 to 99.9884% for metallurgical Si and from 99.999772 to 99.999899% for upgraded metallurgical Si. In addition, large area of silicon nanowires (SiNW) are fabricated. The purification effect induces a ∼35% increase in photocurrent for SiNW based photoelectrochemical cell.Entities:
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Year: 2013 PMID: 23637063 DOI: 10.1002/adma.201300973
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849