Literature DB >> 23443358

Control of 10 nm scale cylinder orientation in self-organized sugar-based block copolymer thin films.

Issei Otsuka1, Salomé Tallegas, Yoko Sakai, Cyrille Rochas, Sami Halila, Sébastien Fort, Ahmad Bsiesy, Thierry Baron, Redouane Borsali.   

Abstract

The present paper describes the orientational control of 10 nm scale cylinders in sugar-based block copolymer thin films by simply varying the composition of the annealing co-solvent. The affinity of the block copolymer to the solvent vapor could be systematically adjusted in this way.

Entities:  

Year:  2013        PMID: 23443358     DOI: 10.1039/c3nr00332a

Source DB:  PubMed          Journal:  Nanoscale        ISSN: 2040-3364            Impact factor:   7.790


  5 in total

1.  Unidirectional Perpendicularly Aligned Lamella-Structured Oligosaccharide (A) ABA Triblock Elastomer (B) Thin Films Utilizing Triazolium+/TFSI- Ionic Nanochannels.

Authors:  Johanna Majoinen; Cécile Bouilhac; Patrice Rannou; Redouane Borsali
Journal:  ACS Macro Lett       Date:  2022-01-03       Impact factor: 6.903

2.  Design and Characterization of Maltoheptaose-b-Polystyrene Nanoparticles, as a Potential New Nanocarrier for Oral Delivery of Tamoxifen.

Authors:  Marcos Antonio Villetti; Adryana Rocha Clementino; Ilaria Dotti; Patricia Regina Ebani; Eride Quarta; Francesca Buttini; Fabio Sonvico; Annalisa Bianchera; Redouane Borsali
Journal:  Molecules       Date:  2021-10-28       Impact factor: 4.411

3.  Heterotelechelic homopolymers mimicking high χ - ultralow N block copolymers with sub-2 nm domain size.

Authors:  E Hancox; M J Derry; M J Greenall; S Huband; L Al-Shok; J S Town; P D Topham; D M Haddleton
Journal:  Chem Sci       Date:  2022-03-14       Impact factor: 9.825

4.  Understanding nanodomain morphology formation in dip-coated PS-b-PEO thin films.

Authors:  Hoang M Nguyen; Ariane V Mader; Swarnalok De; Jaana Vapaavuori
Journal:  Nanoscale Adv       Date:  2021-07-12

5.  Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication.

Authors:  Anette Löfstrand; Reza Jafari Jam; Karolina Mothander; Tommy Nylander; Muhammad Mumtaz; Alexei Vorobiev; Wen-Chang Chen; Redouane Borsali; Ivan Maximov
Journal:  ACS Appl Nano Mater       Date:  2021-05-13
  5 in total

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