Literature DB >> 23389010

Sidewall gratings in ultra-low-loss Si3N4 planar waveguides.

Michael Belt1, Jock Bovington, Renan Moreira, Jared F Bauters, Martijn J R Heck, Jonathon S Barton, John E Bowers, Daniel J Blumenthal.   

Abstract

We demonstrate sidewall gratings in an ultra-low-loss Si3N4 planar waveguide platform. Through proper geometrical design we can achieve coupling constant values between 13 and 310 cm(-1). The TE waveguide propagation loss over the range of 1540 to 1570 nm is below 5.5 dB/m.

Entities:  

Year:  2013        PMID: 23389010     DOI: 10.1364/OE.21.001181

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  2 in total

1.  Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films.

Authors:  Mateusz Śmietana; Robert Mroczyński; Norbert Kwietniewski
Journal:  Materials (Basel)       Date:  2014-02-17       Impact factor: 3.623

Review 2.  Advances in Waveguide Bragg Grating Structures, Platforms, and Applications: An Up-to-Date Appraisal.

Authors:  Muhammad A Butt; Nikolay L Kazanskiy; Svetlana N Khonina
Journal:  Biosensors (Basel)       Date:  2022-07-08
  2 in total

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