| Literature DB >> 23386315 |
Chun-Ting Chou1, Pei-Wei Yu, Ming-Hung Tseng, Che-Chen Hsu, Jing-Jong Shyue, Ching-Chiun Wang, Feng-Yu Tsai.
Abstract
A mixed-deposition atomic layer deposition process produces Hf:ZnO films with uniform dopant distribution and high electrical conductivity (resistivity = 4.5 × 10(-4) W cm), optical transparency (>85% from 400-1800 nm), and moisture-barrier property (water vapor transmission rate = 6.3 × 10(-6) g m(-2) day(-1)).Entities:
Year: 2013 PMID： 23386315 DOI： 10.1002/adma.201204358
Source DB: PubMed Journal: Adv Mater ISSN： 0935-9648 Impact factor: 30.849