| Literature DB >> 23223275 |
Qingzhi Wu1, Yaping Wu, Yufeng Hao, Jianxin Geng, Matthew Charlton, Shanshan Chen, Yujie Ren, Hengxing Ji, Huifeng Li, Danil W Boukhvalov, Richard D Piner, Christopher W Bielawski, Rodney S Ruoff.
Abstract
Monolayer graphene was deposited on a Si wafer substrate decorated with SiO(2) nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.Entities:
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Year: 2013 PMID： 23223275 DOI： 10.1039/c2cc36747e
Source DB: PubMed Journal: Chem Commun (Camb) ISSN： 1359-7345 Impact factor: 6.222