Literature DB >> 23212060

Up-regulation of NOTCH4 gene expression in bipolar disorder.

Ingrid Dieset1, Srdjan Djurovic, Martin Tesli, Sigrun Hope, Morten Mattingsdal, Annika Michelsen, Inge Joa, Tor Ketil Larsen, Ingrid Agartz, Ingrid Melle, Jan Ivar Røssberg, Pål Aukrust, Ole A Andreassen, Thor Ueland.   

Abstract

OBJECTIVE: Immunopathogenic mechanisms have been implicated in schizophrenia and bipolar disorder, and genome-wide association studies (GWAS) point to the major histocompatibility complex, a region that contains many immune-related genes. One of the strongest candidate risk genes for schizophrenia and bipolar disorder is the NOTCH4 gene within the major histocompatibility complex. The authors investigated the NOTCH4 gene expression in individuals with bipolar disorder and schizophrenia relative to healthy comparison subjects and identified putative expression quantitative trait loci in and around the NOTCH4 gene.
METHOD: The authors measured and compared NOTCH4 mRNA in whole blood in 690 individuals (479 patients and 211 healthy comparison subjects) and adjusted for a range of confounders. The authors also genotyped 20 single-nucleotide polymorphisms (SNPs) and investigated possible associations between expression quantitative trait loci and NOTCH4 expression.
RESULTS: The authors found a strong association between NOTCH4 expression and bipolar disorder after adjusting for a range of confounders and multiple testing. In addition, seven SNPs within the NOTCH4 gene region were associated with enhanced NOTCH4 mRNA levels. Three of these expression quantitative trait loci were independent (not in linkage disequilibrium).
CONCLUSIONS: The results indicate that the association between NOTCH4 DNA markers and bipolar disorder is related to altered function at the mRNA level, supporting the notion that NOTCH4 pathways are involved in the pathophysiology of bipolar disorder.

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Year:  2012        PMID: 23212060     DOI: 10.1176/appi.ajp.2012.11091431

Source DB:  PubMed          Journal:  Am J Psychiatry        ISSN: 0002-953X            Impact factor:   18.112


  13 in total

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