| Literature DB >> 23175593 |
Abstract
We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO(2) and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.Entities:
Year: 2012 PMID: 23175593 PMCID: PMC3501131 DOI: 10.1016/j.mee.2012.05.051
Source DB: PubMed Journal: Microelectron Eng ISSN: 0167-9317 Impact factor: 2.523