| Literature DB >> 23128709 |
Tatiana V Amotchkina1, Sebastian Schlichting, Henrik Ehlers, Michael K Trubetskov, Alexander V Tikhonravov, Detlev Ristau.
Abstract
We propose a general approach that allows one to reveal factors causing production errors in the course of the deposition process controlled by broadband optical monitoring. We consider computational experiments simulating the real deposition process as a crucial point of this approach. We demonstrate application of the approach using multiple experimental deposition runs of the selected multilayer coatings.Year: 2012 PMID: 23128709 DOI: 10.1364/AO.51.007604
Source DB: PubMed Journal: Appl Opt ISSN: 1559-128X Impact factor: 1.980