Literature DB >> 23102340

Tuning the area percentage of reactive surface of TiO2 by strain engineering.

Lan Jia1, Da-Jun Shu, Mu Wang.   

Abstract

Surfaces with high reactivity usually have a low area percentage, which greatly limits the efficiency of surface reactivity. In this Letter we demonstrate a generic way of increasing the percentage of the highly reactive surface by using external strain. Bulk and surface elastic properties of TiO2 are studied via density functional theory calculations. The equilibrium shape of anatase TiO2 under applied strain is discussed based on the elastic properties. We find that when 5% compressive strain is applied biaxially along [100] and [010]; directions, the area percentage of the anatase (001) surface can be increased by ~5 times in comparison with the case when no strain is applied. Since the moderate strain does not introduce extrinsic defects into the material, we propose that it is an ideal way to increase the reactivity of titanium dioxide crystallites by applying biaxial compressive external strain along the a axis.

Entities:  

Year:  2012        PMID: 23102340     DOI: 10.1103/PhysRevLett.109.156104

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN: 0031-9007            Impact factor:   9.161


  3 in total

1.  The effect of strain on water dissociation on reduced rutile TiO2(110) surface.

Authors:  Zhi-Wen Wang; Wei-Guang Chen; Da Teng; Jie Zhang; An-Ming Li; Zhao-Han Li; Ya-Nan Tang
Journal:  RSC Adv       Date:  2021-02-24       Impact factor: 3.361

2.  Role of point defects on the reactivity of reconstructed anatase titanium dioxide (001) surface.

Authors:  Yang Wang; Huijuan Sun; Shijing Tan; Hao Feng; Zhengwang Cheng; Jin Zhao; Aidi Zhao; Bing Wang; Yi Luo; Jinlong Yang; J G Hou
Journal:  Nat Commun       Date:  2013       Impact factor: 14.919

3.  A roadmap of strain in doped anatase TiO2.

Authors:  N Kelaidis; A Kordatos; S-R G Christopoulos; A Chroneos
Journal:  Sci Rep       Date:  2018-08-24       Impact factor: 4.379

  3 in total

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