Literature DB >> 23093758

Accurate dosimetry in scanning transmission X-ray microscopes via the cross-linking threshold dose of poly(methyl methacrylate).

Adam F G Leontowich1, Adam P Hitchcock, Tolek Tyliszczak, Markus Weigand, Jian Wang, Chithra Karunakaran.   

Abstract

The sensitivity of various polymers to radiation damage by soft X-rays has been measured previously with scanning transmission X-ray microscopes. However, the critical dose values reported by different groups for the same material differ by more than 100%. Possible sources of this variability are investigated here for poly(methyl methacrylate) (PMMA) using controlled exposure to monochromatic soft X-rays at 300 eV. Radiation sensitivity, judged by several different criteria, was evaluated as a function of dose rate, pre-exposure thermal treatments and X-ray polarization. Both the measured critical dose and the dose required to initiate negative mode (cross-linking) were observed to depend only on dose, not the other factors explored. A method of determining detector efficiency from the dose required to initiate negative mode in PMMA is outlined. This method was applied to many of the soft X-ray STXMs presently operating to derive the efficiencies of their transmitted X-ray detectors in the C 1s absorption-edge region.

Entities:  

Year:  2012        PMID: 23093758     DOI: 10.1107/S0909049512034486

Source DB:  PubMed          Journal:  J Synchrotron Radiat        ISSN: 0909-0495            Impact factor:   2.616


  3 in total

1.  Quantifying signal quality in scanning transmission X-ray microscopy.

Authors:  Benjamin Watts; Simone Finizio; Jörg Raabe
Journal:  J Synchrotron Radiat       Date:  2022-05-16       Impact factor: 2.557

2.  Nanoscale characterization of local structures and defects in photonic crystals using synchrotron-based transmission soft X-ray microscopy.

Authors:  Hyun Woo Nho; Yogesh Kalegowda; Hyun-Joon Shin; Tae Hyun Yoon
Journal:  Sci Rep       Date:  2016-04-18       Impact factor: 4.379

Review 3.  Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities.

Authors:  Andreas Späth
Journal:  Micromachines (Basel)       Date:  2019-11-30       Impact factor: 2.891

  3 in total

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