Enhanced photocatalytic properties of nanoclustered P-doped TiO2 films deposited by advanced atmospheric plasma jet.

A facile preparation of P-doped TiO2 nanoclusters onto fluorine-doped tin oxide (FTO) glass by an advanced atmospheric plasma jet (AAP jet) is reported here. Titanium tetrachloride (TiCl4) and phosphorus trichloride (PCl3) were used as precursors. Radio frequencies were used to generate plasma at fix powder with Argon as carrier gas. Films were deposited at 500 degrees C for 10 minutes. For comparison, as-prepared, annealed and deposited at 500 degrees C samples were studied for chemical/physical properties by scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). Optical properties were studied by using UV-Vis spectroscopy which indicated a reduction in optical band with P-doping. The rhodamine B (Rh-B) degradation by P-doped TiO2 deposited at 500 degrees C showed enhanced degradation efficiency than that of annealed TiO2. The suggested deposition method appears to be suitable for the synthesis of photocatalyst with proper control over dopants.