Literature DB >> 22962759

Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference.

R Sidharthan1, V M Murukeshan, K Sathiyamoorthy.   

Abstract

In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.

Year:  2012        PMID: 22962759     DOI: 10.1166/jnn.2012.6453

Source DB:  PubMed          Journal:  J Nanosci Nanotechnol        ISSN: 1533-4880


  1 in total

1.  Speckle lithography for fabricating Gaussian, quasi-random 2D structures and black silicon structures.

Authors:  Jayachandra Bingi; Vadakke Matham Murukeshan
Journal:  Sci Rep       Date:  2015-12-18       Impact factor: 4.379

  1 in total

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