Literature DB >> 22935029

Stacking of 2D electron gases in Ge probed at the atomic level and its correlation to low-temperature magnetotransport.

G Scappucci1, W M Klesse, A R Hamilton, G Capellini, D L Jaeger, M R Bischof, R F Reidy, B P Gorman, M Y Simmons.   

Abstract

Stacking of two-dimensional electron gases (2DEGs) obtained by δ-doping of Ge and patterned by scanning probe lithography is a promising approach to realize ultrascaled 3D epitaxial circuits, where multiple layers of active electronic components are integrated both vertically and horizontally. We use atom probe tomography and magnetotransport to correlate the real space 3D atomic distribution of dopants in the crystal with the quantum correction to the conductivity observed at low temperatures, probing if closely stacked δ-layers in Ge behave as independent 2DEGs. We find that at a separation of 9 nm the stacked-2DEGs, while interacting, still maintain their individuality in terms of electron transport and show long phase coherence lengths (∼220 nm). Strong vertical electron confinement is crucial to this finding, resulting in an interlayer scattering time much longer (∼1000 × ) than the scattering time within the dopant plane.

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Year:  2012        PMID: 22935029     DOI: 10.1021/nl302558b

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  3 in total

1.  Dephasing rates for weak localization and universal conductance fluctuations in two dimensional Si:P and Ge:P δ-layers.

Authors:  Saquib Shamim; S Mahapatra; G Scappucci; W M Klesse; M Y Simmons; Arindam Ghosh
Journal:  Sci Rep       Date:  2017-05-04       Impact factor: 4.379

2.  Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography.

Authors:  Yizhi Wu; A Devin Giddings; Marcel A Verheijen; Bart Macco; Ty J Prosa; David J Larson; Fred Roozeboom; Wilhelmus M M Kessels
Journal:  Chem Mater       Date:  2018-02-05       Impact factor: 9.811

3.  Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating.

Authors:  Masao Sakuraba; Katsutoshi Sugawara; Takayuki Nosaka; Hisanao Akima; Shigeo Sato
Journal:  Sci Technol Adv Mater       Date:  2017-04-27       Impact factor: 8.090

  3 in total

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