Literature DB >> 22922454

Electron beam induced chemical dry etching and imaging in gaseous NH3 environments.

Charlene J Lobo1, Aiden Martin, Matthew R Phillips, Milos Toth.   

Abstract

We report the use of ammonia (NH(3)) vapor as a new precursor for nanoscale electron beam induced etching (EBIE) of carbon, and an efficient imaging medium for environmental scanning electron microscopy (ESEM). Etching is demonstrated using amorphous carbonaceous nanowires grown by electron beam induced deposition (EBID). It is ascribed to carbon volatilization by hydrogen radicals generated by electron dissociation of NH(3) adsorbates. The volatilization process is also effective at preventing the buildup of residual hydrocarbon impurities that often compromise EBIE, EBID and electron imaging. We also show that ammonia is a more efficient electron imaging medium than H(2)O, which up to now has been the most commonly used ESEM imaging gas.

Entities:  

Year:  2012        PMID: 22922454     DOI: 10.1088/0957-4484/23/37/375302

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  3 in total

Review 1.  Continuum models of focused electron beam induced processing.

Authors:  Milos Toth; Charlene Lobo; Vinzenz Friedli; Aleksandra Szkudlarek; Ivo Utke
Journal:  Beilstein J Nanotechnol       Date:  2015-07-14       Impact factor: 3.649

2.  Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material.

Authors:  Sangeetha Hari; P H F Trompenaars; J J L Mulders; Pieter Kruit; C W Hagen
Journal:  Micromachines (Basel)       Date:  2020-12-24       Impact factor: 2.891

3.  Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate.

Authors:  Aiden A Martin; Philip J Depond
Journal:  Beilstein J Nanotechnol       Date:  2018-04-24       Impact factor: 3.649

  3 in total

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