Literature DB >> 22859103

Trimming of high-Q-factor silicon ring resonators by electron beam bleaching.

Stefan Prorok1, Alexander Yu Petrov, Manfred Eich, Jingdong Luo, Alex K-Y Jen.   

Abstract

We demonstrate a novel position-resolved resonance trimming strategy for silicon ring resonators. Ring resonators are covered with a chromophore-doped guest host polymer cladding. Illumination of the polymer cladding with high-energy electrons causes a bleaching of the chromophore molecules. Bleaching of the chromophores induces a reduction of the polymer refractive index, which can be used to trim the resonance frequency of the ring resonators. A maximum refractive index change of 0.06 and a TM polarization resonance shift of 16.4 nm have been measured. A Q factor of 20,000 before bleaching remains unaltered after the electron beam exposure process.

Entities:  

Year:  2012        PMID: 22859103     DOI: 10.1364/OL.37.003114

Source DB:  PubMed          Journal:  Opt Lett        ISSN: 0146-9592            Impact factor:   3.776


  1 in total

Review 1.  Ge Ion Implanted Photonic Devices and Annealing for Emerging Applications.

Authors:  Xingshi Yu; Xia Chen; Milan M Milosevic; Weihong Shen; Rob Topley; Bigeng Chen; Xingzhao Yan; Wei Cao; David J Thomson; Shinichi Saito; Anna C Peacock; Otto L Muskens; Graham T Reed
Journal:  Micromachines (Basel)       Date:  2022-02-12       Impact factor: 2.891

  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.