| Literature DB >> 22714212 |
Jason S Orcutt1, Benjamin Moss, Chen Sun, Jonathan Leu, Michael Georgas, Jeffrey Shainline, Eugen Zgraggen, Hanqing Li, Jie Sun, Matthew Weaver, Stevan Urošević, Miloš Popović, Rajeev J Ram, Vladimir Stojanović.
Abstract
This paper presents photonic devices with 3 dB/cm waveguide loss fabricated in an existing commercial electronic 45 nm SOI-CMOS foundry process. By utilizing existing front-end fabrication processes the photonic devices are monolithically integrated with electronics in the same physical device layer as transistors achieving 4 ps logic stage delay, without degradation in transistor performance. We demonstrate an 8-channel optical microring-resonator filter bank and optical modulators, both controlled by integrated digital circuits. By developing a device design methodology that requires zero process infrastructure changes, a widely available platform for high-performance photonic-electronic integrated circuits is enabled.Mesh:
Year: 2012 PMID: 22714212 DOI: 10.1364/OE.20.012222
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894