Literature DB >> 22707001

Observation of conductance quantization in oxide-based resistive switching memory.

Xiaojian Zhu1, Wenjing Su, Yiwei Liu, Benlin Hu, Liang Pan, Wei Lu, Jiandi Zhang, Run-Wei Li.   

Abstract

Conductance quantization phenomena are observed in oxide-based resistive switching memories. These phenomena can be understood by the formation and disruption of atomic-scale conductive filaments in the insulating oxide matrix. The quantum conductance effect can be artificially modulated by controlling the electrical parameters in Set and Reset processes, and can be used for multi-level data storage and help understand and design one-dimensional structures at atomic scales in various materials systems.
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Year:  2012        PMID: 22707001     DOI: 10.1002/adma.201201506

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  24 in total

1.  Voltage and power-controlled regimes in the progressive unipolar RESET transition of HfO₂-based RRAM.

Authors:  Shibing Long; Luca Perniola; Carlo Cagli; Julien Buckley; Xiaojuan Lian; Enrique Miranda; Feng Pan; Ming Liu; Jordi Suñé
Journal:  Sci Rep       Date:  2013-10-14       Impact factor: 4.379

2.  Transparent multi-level resistive switching phenomena observed in ITO/RGO/ITO memory cells by the sol-gel dip-coating method.

Authors:  Hee-Dong Kim; Min Ju Yun; Jae Hoon Lee; Kyoeng Heon Kim; Tae Geun Kim
Journal:  Sci Rep       Date:  2014-04-09       Impact factor: 4.379

3.  Evolution of conductive filament and its impact on reliability issues in oxide-electrolyte based resistive random access memory.

Authors:  Hangbing Lv; Xiaoxin Xu; Hongtao Liu; Ruoyu Liu; Qi Liu; Writam Banerjee; Haitao Sun; Shibing Long; Ling Li; Ming Liu
Journal:  Sci Rep       Date:  2015-01-14       Impact factor: 4.379

4.  Compliance-Free, Digital SET and Analog RESET Synaptic Characteristics of Sub-Tantalum Oxide Based Neuromorphic Device.

Authors:  Yawar Abbas; Yu-Rim Jeon; Andrey Sergeevich Sokolov; Sohyeon Kim; Boncheol Ku; Changhwan Choi
Journal:  Sci Rep       Date:  2018-01-19       Impact factor: 4.379

5.  Electric-field control of ferromagnetism through oxygen ion gating.

Authors:  Hao-Bo Li; Nianpeng Lu; Qinghua Zhang; Yujia Wang; Deqiang Feng; Tianzhe Chen; Shuzhen Yang; Zheng Duan; Zhuolu Li; Yujun Shi; Weichao Wang; Wei-Hua Wang; Kui Jin; Hui Liu; Jing Ma; Lin Gu; Cewen Nan; Pu Yu
Journal:  Nat Commun       Date:  2017-12-18       Impact factor: 14.919

Review 6.  On the Thermal Models for Resistive Random Access Memory Circuit Simulation.

Authors:  Juan B Roldán; Gerardo González-Cordero; Rodrigo Picos; Enrique Miranda; Félix Palumbo; Francisco Jiménez-Molinos; Enrique Moreno; David Maldonado; Santiago B Baldomá; Mohamad Moner Al Chawa; Carol de Benito; Stavros G Stavrinides; Jordi Suñé; Leon O Chua
Journal:  Nanomaterials (Basel)       Date:  2021-05-11       Impact factor: 5.076

7.  Key concepts behind forming-free resistive switching incorporated with rectifying transport properties.

Authors:  Yao Shuai; Xin Ou; Wenbo Luo; Arndt Mücklich; Danilo Bürger; Shengqiang Zhou; Chuangui Wu; Yuanfu Chen; Wanli Zhang; Manfred Helm; Thomas Mikolajick; Oliver G Schmidt; Heidemarie Schmidt
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

8.  Quantum conductance in silicon oxide resistive memory devices.

Authors:  A Mehonic; A Vrajitoarea; S Cueff; S Hudziak; H Howe; C Labbé; R Rizk; M Pepper; A J Kenyon
Journal:  Sci Rep       Date:  2013       Impact factor: 4.379

9.  Quantized conductance coincides with state instability and excess noise in tantalum oxide memristors.

Authors:  Wei Yi; Sergey E Savel'ev; Gilberto Medeiros-Ribeiro; Feng Miao; M-X Zhang; J Joshua Yang; Alexander M Bratkovsky; R Stanley Williams
Journal:  Nat Commun       Date:  2016-04-04       Impact factor: 14.919

10.  Conductance Quantization in Resistive Random Access Memory.

Authors:  Yang Li; Shibing Long; Yang Liu; Chen Hu; Jiao Teng; Qi Liu; Hangbing Lv; Jordi Suñé; Ming Liu
Journal:  Nanoscale Res Lett       Date:  2015-10-26       Impact factor: 4.703

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