Literature DB >> 22667613

Plasma ion source for in situ ion bombardment in a soft x-ray magnetic scattering diffractometer.

Daniel Lengemann1, Dieter Engel, Arno Ehresmann.   

Abstract

A new plasma ion source for in situ keV He ion bombardment of solid state samples or thin films was designed and built for ion fluences between 1 × 10(12) and 1 × 10(17) ions/cm(2). The system was designed to be mounted to different diffraction chambers for soft x-ray resonant magnetic scattering. Without breaking the vacuum due to He-ion bombardment, structural and magnetic modifications of the samples can be studied in situ and element specifically.

Entities:  

Year:  2012        PMID： 22667613     DOI： 10.1063/1.4718937

Source DB:  PubMed          Journal:  Rev Sci Instrum        ISSN： 0034-6748            Impact factor:   1.523


  2 in total

1.  Tailoring magnetic anisotropy gradients by ion bombardment for domain wall positioning in magnetic multilayers with perpendicular anisotropy.

Authors:  Michał Matczak; Bogdan Szymański; Piotr Kuświk; Maciej Urbaniak; Feliks Stobiecki; Zbigniew Kurant; Andrzej Maziewski; Daniel Lengemann; Arno Ehresmann
Journal:  Nanoscale Res Lett       Date:  2014-08-13       Impact factor: 4.703

2.  Tailoring Perpendicular Exchange Bias Coupling in Au/Co/NiO Systems by Ion Bombardment.

Authors:  Piotr Kuświk; Alexander Gaul; Maciej Urbaniak; Marek Schmidt; Jacek Aleksiejew; Arno Ehresmann; Feliks Stobiecki
Journal:  Nanomaterials (Basel)       Date:  2018-10-10       Impact factor: 5.076
  2 in total

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