Literature DB >> 22625409

Exploratory combustion synthesis: amorphous indium yttrium oxide for thin-film transistors.

Jonathan W Hennek1, Myung-Gil Kim, Mercouri G Kanatzidis, Antonio Facchetti, Tobin J Marks.   

Abstract

We report the implementation of amorphous indium yttrium oxide (a-IYO) as a thin-film transistor (TFT) semiconductor. Amorphous and polycrystalline IYO films were grown via a low-temperature solution process utilizing exothermic "combustion" precursors. Precursor transformation and the IYO films were analyzed by differential thermal analysis, thermogravimetric analysis, X-ray diffraction, atomic force microscopy, X-ray photoelectron spectroscopy, and optical transmission, which reveal efficient conversion to the metal oxide lattice and smooth, transparent films. a-IYO TFTs fabricated with a hybrid nanodielectric exhibit electron mobilities of 7.3 cm(2) V(-1) s(-1) (T(anneal) = 300 °C) and 5.0 cm(2) V(-1) s(-1) (T(anneal) = 250 °C) for 2 V operation.

Entities:  

Year:  2012        PMID: 22625409     DOI: 10.1021/ja303589v

Source DB:  PubMed          Journal:  J Am Chem Soc        ISSN: 0002-7863            Impact factor:   15.419


  7 in total

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Review 2.  Metal oxides for optoelectronic applications.

Authors:  Xinge Yu; Tobin J Marks; Antonio Facchetti
Journal:  Nat Mater       Date:  2016-04       Impact factor: 43.841

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Journal:  Sci Rep       Date:  2016-07-14       Impact factor: 4.379

4.  Hybrid cluster precursors of the LaZrO insulator for transistors: lowering the processing temperature.

Authors:  Peixin Zhu; Jinwang Li; Phan Trong Tue; Satoshi Inoue; Tatsuya Shimoda
Journal:  Sci Rep       Date:  2018-04-12       Impact factor: 4.379

5.  A self-driving laboratory advances the Pareto front for material properties.

Authors:  Benjamin P MacLeod; Fraser G L Parlane; Connor C Rupnow; Kevan E Dettelbach; Michael S Elliott; Thomas D Morrissey; Ted H Haley; Oleksii Proskurin; Michael B Rooney; Nina Taherimakhsousi; David J Dvorak; Hsi N Chiu; Christopher E B Waizenegger; Karry Ocean; Mehrdad Mokhtari; Curtis P Berlinguette
Journal:  Nat Commun       Date:  2022-02-22       Impact factor: 17.694

6.  Fully solution-induced high performance indium oxide thin film transistors with ZrO x high-k gate dielectrics.

Authors:  Li Zhu; Gang He; Jianguo Lv; Elvira Fortunato; Rodrigo Martins
Journal:  RSC Adv       Date:  2018-05-08       Impact factor: 3.361

7.  Tailoring IGZO Composition for Enhanced Fully Solution-Based Thin Film Transistors.

Authors:  Marco Moreira; Emanuel Carlos; Carlos Dias; Jonas Deuermeier; Maria Pereira; Pedro Barquinha; Rita Branquinho; Rodrigo Martins; Elvira Fortunato
Journal:  Nanomaterials (Basel)       Date:  2019-09-06       Impact factor: 5.076

  7 in total

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