Literature DB >> 22589977

6,6-Dimethyl-2H,5H,6H,7H-1,3-dithiolo[4,5-f][1,5,3]dithia-silepin-2-one.

Hongqi Li, Xuebin Zhang, Zhongbao Zhang, Zhen Chen, Jiajian Peng.   

Abstract

In the structure of the title compound, C(7)H(10)OS(4)Si, the carbonyl O atom lies in the plane of the five-membered dithiole ring with a deviation of only 0.022 (2) Å. The seven-membered ring adopts a chair conformation. The crystal packing is stabilized by S⋯O [3.096 (4) Å] and S⋯S [3.620 (4) Å] contacts, together with C-H⋯S inter-actions.

Entities:  

Year:  2012        PMID: 22589977      PMCID: PMC3344068          DOI: 10.1107/S1600536812011142

Source DB:  PubMed          Journal:  Acta Crystallogr Sect E Struct Rep Online        ISSN: 1600-5368


Related literature

For silicon-containing tetra­thia­fulvalene (TTF) derivatives as ligands, see: Guyon et al. (2005 ▶), and as precursors for the construction of polymetallic arrays, see: Hameau et al. (2008 ▶). For their use in the preparation of conducting charge-transfer complexes and radical-cation salts, see: Biaso et al. (2007 ▶). For the synthesis, see: Li et al. (2012 ▶). For related structures, see: Arumugam et al. (2011 ▶); Hou et al. (2009 ▶).

Experimental

Crystal data

C7H10OS4Si M = 266.48 Triclinic, a = 6.148 (7) Å b = 8.569 (10) Å c = 11.846 (14) Å α = 69.292 (12)° β = 85.821 (13)° γ = 83.129 (13)° V = 579.2 (12) Å3 Z = 2 Mo Kα radiation μ = 0.88 mm−1 T = 296 K 0.12 × 0.10 × 0.08 mm

Data collection

Bruker APEXII CCD diffractometer Absorption correction: multi-scan (SADABS; Sheldrick, 2004 ▶) T min = 0.901, T max = 0.933 4000 measured reflections 2012 independent reflections 1628 reflections with I > 2σ(I) R int = 0.019

Refinement

R[F 2 > 2σ(F 2)] = 0.031 wR(F 2) = 0.072 S = 1.01 2012 reflections 120 parameters H-atom parameters constrained Δρmax = 0.25 e Å−3 Δρmin = −0.26 e Å−3 Data collection: APEX2 (Bruker, 2004 ▶); cell refinement: SAINT (Bruker, 2004 ▶); data reduction: SAINT; program(s) used to solve structure: SHELXS97 (Sheldrick, 2008 ▶); program(s) used to refine structure: SHELXL97 (Sheldrick, 2008 ▶); molecular graphics: SHELXTL; software used to prepare material for publication: SHELXTL. Crystal structure: contains datablock(s) global, I. DOI: 10.1107/S1600536812011142/sj5206sup1.cif Structure factors: contains datablock(s) I. DOI: 10.1107/S1600536812011142/sj5206Isup2.hkl Supplementary material file. DOI: 10.1107/S1600536812011142/sj5206Isup3.cml Additional supplementary materials: crystallographic information; 3D view; checkCIF report
C7H10OS4SiZ = 2
Mr = 266.48F(000) = 276
Triclinic, P1Dx = 1.528 Mg m3
Hall symbol: -P 1Melting point = 325–326 K
a = 6.148 (7) ÅMo Kα radiation, λ = 0.71073 Å
b = 8.569 (10) ÅCell parameters from 1863 reflections
c = 11.846 (14) Åθ = 2.6–27.4°
α = 69.292 (12)°µ = 0.88 mm1
β = 85.821 (13)°T = 296 K
γ = 83.129 (13)°Block, colorless
V = 579.2 (12) Å30.12 × 0.10 × 0.08 mm
Bruker APEXII CCD diffractometer2012 independent reflections
Radiation source: fine-focus sealed tube1628 reflections with I > 2σ(I)
Graphite monochromatorRint = 0.019
φ and ω scansθmax = 25.0°, θmin = 2.6°
Absorption correction: multi-scan (SADABS; Sheldrick, 2004)h = −7→7
Tmin = 0.901, Tmax = 0.933k = −10→10
4000 measured reflectionsl = −14→12
Refinement on F2Primary atom site location: structure-invariant direct methods
Least-squares matrix: fullSecondary atom site location: difference Fourier map
R[F2 > 2σ(F2)] = 0.031Hydrogen site location: inferred from neighbouring sites
wR(F2) = 0.072H-atom parameters constrained
S = 1.01w = 1/[σ2(Fo2) + (0.027P)2 + 0.3021P] where P = (Fo2 + 2Fc2)/3
2012 reflections(Δ/σ)max = 0.001
120 parametersΔρmax = 0.25 e Å3
0 restraintsΔρmin = −0.26 e Å3
Geometry. All e.s.d.'s (except the e.s.d. in the dihedral angle between two l.s. planes) are estimated using the full covariance matrix. The cell e.s.d.'s are taken into account individually in the estimation of e.s.d.'s in distances, angles and torsion angles; correlations between e.s.d.'s in cell parameters are only used when they are defined by crystal symmetry. An approximate (isotropic) treatment of cell e.s.d.'s is used for estimating e.s.d.'s involving l.s. planes.
Refinement. Refinement of F2 against ALL reflections. The weighted R-factor wR and goodness of fit S are based on F2, conventional R-factors R are based on F, with F set to zero for negative F2. The threshold expression of F2 > σ(F2) is used only for calculating R-factors(gt) etc. and is not relevant to the choice of reflections for refinement. R-factors based on F2 are statistically about twice as large as those based on F, and R- factors based on ALL data will be even larger.
xyzUiso*/Ueq
C11.2928 (4)0.0788 (3)0.3530 (2)0.0504 (7)
C20.9211 (4)0.2483 (3)0.2614 (2)0.0417 (6)
C30.9299 (4)0.2691 (3)0.3675 (2)0.0406 (6)
C40.7687 (4)0.5515 (3)0.0965 (2)0.0439 (6)
H4A0.70850.60270.01670.053*
H4B0.92600.55680.08730.053*
C50.7677 (4)0.5943 (3)0.3452 (2)0.0476 (7)
H5A0.92370.60600.33720.057*
H5B0.70130.66360.39040.057*
C60.7323 (5)0.8941 (3)0.1163 (3)0.0650 (8)
H6A0.68180.93810.03510.097*
H6B0.88900.89190.11470.097*
H6C0.66720.96400.16010.097*
C70.3523 (4)0.6708 (4)0.2051 (3)0.0597 (8)
H7A0.28890.73720.25190.090*
H7B0.32000.55680.24430.090*
H7C0.29200.71450.12610.090*
O11.4633 (3)−0.0091 (3)0.37000 (19)0.0718 (6)
S11.16208 (11)0.17662 (9)0.45212 (6)0.0500 (2)
S21.14230 (12)0.12822 (9)0.22118 (7)0.0539 (2)
S30.71611 (11)0.33291 (8)0.15538 (7)0.0519 (2)
S40.72980 (11)0.37770 (10)0.43285 (6)0.0561 (2)
Si10.65327 (11)0.67844 (9)0.19121 (7)0.04113 (19)
U11U22U33U12U13U23
C10.0479 (16)0.0476 (16)0.0509 (17)0.0014 (13)−0.0094 (13)−0.0116 (13)
C20.0408 (14)0.0361 (14)0.0462 (15)−0.0036 (11)−0.0095 (11)−0.0106 (12)
C30.0349 (13)0.0416 (14)0.0396 (14)−0.0054 (11)−0.0040 (11)−0.0063 (12)
C40.0450 (15)0.0410 (15)0.0408 (15)0.0001 (11)−0.0060 (12)−0.0085 (12)
C50.0355 (13)0.0572 (17)0.0579 (17)−0.0006 (12)0.0021 (12)−0.0317 (14)
C60.0622 (19)0.0425 (16)0.087 (2)−0.0083 (14)0.0008 (17)−0.0189 (16)
C70.0345 (14)0.0643 (19)0.078 (2)0.0007 (13)−0.0026 (14)−0.0239 (17)
O10.0599 (13)0.0760 (15)0.0739 (15)0.0266 (11)−0.0219 (11)−0.0261 (12)
S10.0450 (4)0.0574 (4)0.0450 (4)0.0013 (3)−0.0140 (3)−0.0141 (3)
S20.0602 (4)0.0494 (4)0.0527 (4)0.0113 (3)−0.0155 (3)−0.0214 (3)
S30.0549 (4)0.0422 (4)0.0610 (5)−0.0007 (3)−0.0273 (3)−0.0176 (3)
S40.0457 (4)0.0701 (5)0.0429 (4)0.0004 (3)0.0075 (3)−0.0114 (4)
Si10.0305 (3)0.0406 (4)0.0525 (4)−0.0031 (3)0.0015 (3)−0.0171 (3)
C1—O11.200 (3)C5—S41.812 (3)
C1—S11.768 (3)C5—Si11.865 (3)
C1—S21.767 (3)C5—H5A0.9700
C2—C31.336 (4)C5—H5B0.9700
C2—S21.747 (3)C6—Si11.852 (3)
C2—S31.749 (3)C6—H6A0.9600
C3—S11.746 (3)C6—H6B0.9600
C3—S41.753 (3)C6—H6C0.9600
C4—S31.813 (3)C7—Si11.853 (3)
C4—Si11.873 (3)C7—H7A0.9600
C4—H4A0.9700C7—H7B0.9600
C4—H4B0.9700C7—H7C0.9600
O1—C1—S1125.6 (2)Si1—C6—H6B109.5
O1—C1—S2122.9 (2)H6A—C6—H6B109.5
S1—C1—S2111.47 (17)Si1—C6—H6C109.5
C3—C2—S2116.77 (19)H6A—C6—H6C109.5
C3—C2—S3127.3 (2)H6B—C6—H6C109.5
S2—C2—S3115.90 (16)Si1—C7—H7A109.5
C2—C3—S1117.2 (2)Si1—C7—H7B109.5
C2—C3—S4126.9 (2)H7A—C7—H7B109.5
S1—C3—S4115.92 (16)Si1—C7—H7C109.5
S3—C4—Si1115.17 (15)H7A—C7—H7C109.5
S3—C4—H4A108.5H7B—C7—H7C109.5
Si1—C4—H4A108.5C3—S1—C197.14 (15)
S3—C4—H4B108.5C2—S2—C197.32 (14)
Si1—C4—H4B108.5C2—S3—C4100.85 (12)
H4A—C4—H4B107.5C3—S4—C5102.02 (14)
S4—C5—Si1116.21 (14)C6—Si1—C7112.72 (14)
S4—C5—H5A108.2C6—Si1—C5107.85 (14)
Si1—C5—H5A108.2C7—Si1—C5108.97 (14)
S4—C5—H5B108.2C6—Si1—C4107.65 (15)
Si1—C5—H5B108.2C7—Si1—C4107.94 (13)
H5A—C5—H5B107.4C5—Si1—C4111.76 (14)
Si1—C6—H6A109.5
D—H···AD—HH···AD···AD—H···A
C5—H5B···S1i0.972.893.673 (5)138
Table 1

Hydrogen-bond geometry (Å, °)

D—H⋯AD—HH⋯ADAD—H⋯A
C5—H5B⋯S1i0.972.893.673 (5)138

Symmetry code: (i) .

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4.  Intramolecular mixed-valence state through silicon or germanium double bridges in rigid bis(tetrathiafulvalenes).

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5.  4,6,7,9,10,12,13,15-Octa-hydro-2H-1,3-dithiolo[4,5-i][1,4,7,12]dioxadithia-cyclo-tetra-decine-2-thione.

Authors:  Rui-Bin Hou; Bao Li; Tie Chen; Bing-Zhu Yin; Li-Xin Wu
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