Literature DB >> 22544486

Imaging and nanofabrication with the helium ion microscope of the Van Leeuwenhoek Laboratory in Delft.

Paul F A Alkemade1, Emma M Koster, Emile van Veldhoven, Diederik J Maas.   

Abstract

Although helium ion microscopy (HIM) was introduced only a few years ago, many new application fields are emerging. The connecting factor between these novel applications is the unique interaction of the primary helium ion beam with the sample material at and just below its surface. In particular, the HIM secondary electron signal stems from an area that is extremely well localized around the point of incidence of the primary beam. This makes the HIM well suited for both high-resolution imaging and high-resolution nanofabrication. Another advantage in nanofabrication is the low ion backscattering fraction, which leads to a weak proximity effect. The subnanometer probe size and the unique beam-materials interactions have opened new areas of research. This review presents a selection of studies conducted on a single instrument. The selection encompasses applications ranging from imaging to nanofabrication and from fundamental academic research to applied industrial developments. © Wiley Periodicals, Inc.

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Year:  2012        PMID: 22544486     DOI: 10.1002/sca.21009

Source DB:  PubMed          Journal:  Scanning        ISSN: 0161-0457            Impact factor:   1.932


  2 in total

1.  Scanning reflection ion microscopy in a helium ion microscope.

Authors:  Yuri V Petrov; Oleg F Vyvenko
Journal:  Beilstein J Nanotechnol       Date:  2015-05-07       Impact factor: 3.649

2.  Monte Carlo simulation of nanoscale material focused ion beam gas-assisted etching: Ga+ and Ne+ etching of SiO2 in the presence of a XeF2 precursor gas.

Authors:  Kyle T Mahady; Shida Tan; Yuval Greenzweig; Amir Raveh; Philip D Rack
Journal:  Nanoscale Adv       Date:  2019-07-30
  2 in total

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