Literature DB >> 22516621

Memristive tri-stable resistive switching at ruptured conducting filaments of a Pt/TiO₂/Pt cell.

Kyung Jean Yoon1, Min Hwan Lee, Gun Hwan Kim, Seul Ji Song, Jun Yeong Seok, Sora Han, Jung Ho Yoon, Kyung Min Kim, Cheol Seong Hwang.   

Abstract

A tri-stable memristive switching was demonstrated on a Pt/TiO₂/Pt device and its underlying mechanism was suggested through a series of electrical measurements. Tri-stable switching could be initiated from a device in unipolar reset status. The unipolar reset status was obtained by performing an electroforming step on a pristine cell which was then followed by unipolar reset switching. It was postulated that tri-stable switching occurred at the location where the conductive filament (initially formed by the electroforming step) was ruptured by a subsequent unipolar reset process. The mechanism of the tri-stable memristive switching presented in this article was attributed to the migration of oxygen ions through the ruptured filament region and the resulting modulation of the Schottky-like interfaces. The assertion was further supported by a comparison study performed on a Pt/TiO₂/TiO(2-x)/Pt cell.

Entities:  

Year:  2012        PMID: 22516621     DOI: 10.1088/0957-4484/23/18/185202

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  7 in total

1.  Memristive devices for computing.

Authors:  J Joshua Yang; Dmitri B Strukov; Duncan R Stewart
Journal:  Nat Nanotechnol       Date:  2013-01       Impact factor: 39.213

2.  Interfacial chemical bonding-mediated ionic resistive switching.

Authors:  Hyeongjoo Moon; Vishal Zade; Hung-Sen Kang; Jin-Woo Han; Eunseok Lee; Cheol Seong Hwang; Min Hwan Lee
Journal:  Sci Rep       Date:  2017-04-28       Impact factor: 4.379

3.  First-principles study on transition metal-doped anatase TiO2.

Authors:  Yaqin Wang; Ruirui Zhang; Jianbao Li; Liangliang Li; Shiwei Lin
Journal:  Nanoscale Res Lett       Date:  2014-01-28       Impact factor: 4.703

4.  Resistance switching behavior of atomic layer deposited SrTiO3 film through possible formation of Sr2Ti6O13 or Sr1Ti11O20 phases.

Authors:  Woongkyu Lee; Sijung Yoo; Kyung Jean Yoon; In Won Yeu; Hye Jung Chang; Jung-Hae Choi; Susanne Hoffmann-Eifert; Rainer Waser; Cheol Seong Hwang
Journal:  Sci Rep       Date:  2016-02-02       Impact factor: 4.379

5.  Thickness effect of ultra-thin Ta2O5 resistance switching layer in 28 nm-diameter memory cell.

Authors:  Tae Hyung Park; Seul Ji Song; Hae Jin Kim; Soo Gil Kim; Suock Chung; Beom Yong Kim; Kee Jeung Lee; Kyung Min Kim; Byung Joon Choi; Cheol Seong Hwang
Journal:  Sci Rep       Date:  2015-11-03       Impact factor: 4.379

Review 6.  Status and Prospects of ZnO-Based Resistive Switching Memory Devices.

Authors:  Firman Mangasa Simanjuntak; Debashis Panda; Kung-Hwa Wei; Tseung-Yuen Tseng
Journal:  Nanoscale Res Lett       Date:  2016-08-19       Impact factor: 4.703

7.  Short-Term Memory Dynamics of TiN/Ti/TiO2/SiOx/Si Resistive Random Access Memory.

Authors:  Hyojong Cho; Sungjun Kim
Journal:  Nanomaterials (Basel)       Date:  2020-09-12       Impact factor: 5.076

  7 in total

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