Literature DB >> 22488639

Enhanced lithographic imaging layer meets semiconductor manufacturing specification a decade early.

Yu-Chih Tseng1, Anil U Mane, Jeffrey W Elam, Seth B Darling.   

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Year:  2012        PMID： 22488639     DOI： 10.1002/adma.201104871

Source DB:  PubMed          Journal:  Adv Mater        ISSN： 0935-9648            Impact factor:   30.849


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  2 in total

1.  New Insights into Sequential Infiltration Synthesis.

Authors:  Jeffrey W Elam; Mahua Biswas; Seth B Darling; Angel Yanguas-Gil; Jonathan D Emery; Alex B F Martinson; Paul F Nealey; Tamar Segal-Peretz; Qing Peng; Jonathan Winterstein; J Alexander Liddle; Yu-Chih Tseng
Journal:  ECS Trans       Date:  2015

2.  Conformal Coating of Freestanding Particles by Vapor-Phase Infiltration.

Authors:  Andreas C Liapis; Ashwanth Subramanian; Sangyeon Cho; Kim Kisslinger; Chang-Yong Nam; Seok-Hyun Yun
Journal:  Adv Mater Interfaces       Date:  2020-11-09       Impact factor: 6.147
  2 in total

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