| Literature DB >> 22483836 |
B A Wols1, C H M Hofman-Caris.
Abstract
Emerging organic contaminants (pharmaceutical compounds, personal care products, pesticides, hormones, surfactants, fire retardants, fuel additives etc.) are increasingly found in water sources and therefore need to be controlled by water treatment technology. UV advanced oxidation technologies are often used as an effective barrier against organic contaminants. The combined operation of direct photolysis and reaction with hydroxyl radicals ensures good results for a wide range of contaminants. In this review, an overview is provided of the photochemical reaction parameters (quantum yield, molar absorption, OH radical reaction rate constant) of more than 100 organic micropollutants. These parameters allow for a prediction of organic contaminant removal by UV advanced oxidation systems. An example of contaminant degradation is elaborated for a simplified UV/H(2)O(2) system.Entities:
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Year: 2012 PMID: 22483836 DOI: 10.1016/j.watres.2012.03.036
Source DB: PubMed Journal: Water Res ISSN: 0043-1354 Impact factor: 11.236